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- Title
Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography.
- Authors
W. G. Wang; Pearse, A.; M. Li; Hageman, S.; A. X. Chen; F. Q. Zhu; C. L. Chien
- Abstract
We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.
- Subjects
MAGNETIC tunnelling; ELECTRON beam lithography; POLYSTYRENE; TUNNEL junctions (Materials science); MAGNETORESISTANCE
- Publication
Scientific Reports, 2013, p1
- ISSN
2045-2322
- Publication type
Article
- DOI
10.1038/srep01948