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- Title
Selective functionalization of silicon surface controlled by metastable helium atom beam for patterning chemisorbed monolayer molecular assemblies.
- Authors
Wang, Z. P.; Zhang, J. W.; Zhang, Z. M.; Ding, Z. J.; Yamauchi, Y.
- Abstract
Metastable neutral helium atoms are highly chemical sensitive to surface dangling bonds. As the basis of a new lithographic technique, a method for fabrication of self-assembled monolayers (SAMs) and mixed SAMs by the irradiation-promoted exchange reaction has been recently developed. Metastable helium atoms irradiation is shown to modify organosilane SAM films and Si-H and Si-OH covering surfaces, which render the surface amendable to further SAM modification. The exposure regions can undergo a second chemisorption reaction to produce an assembly of octadecyltrichlorosilane SAMs. Metastable helium atom beam patterned films can be used as templates for selective buildup of fluorophores, amino group, and biological cells to obtain further surface functionalization. Copyright © 2014 John Wiley & Sons, Ltd.
- Subjects
SILICON; HELIUM atom; IRRADIATION; CHEMISORPTION; MONOMOLECULAR films; FLUOROPHORES
- Publication
Surface & Interface Analysis: SIA, 2014, Vol 46, Issue 12/13, p1196
- ISSN
0142-2421
- Publication type
Article
- DOI
10.1002/sia.5598