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- Title
Dedicated Co-deposition System for Metallic Paramagnetic Films.
- Authors
Jaeckel, F.; Kotsubo, V.; Hall, J.; Cantor, R.; Boyd, S.
- Abstract
We describe a dedicated co-sputtering/ion-mill system developed to study metallic paramagnetic films for use in magnetic microcalorimetry. Small-diameter sputtering guns allow study of several precious-metal paramagnetic alloy systems within a reasonable budget. We demonstrated safe operation of a 1″ sputtering gun at greater than five times the rated maximum power, achieving deposition rates up to ∼ 900 Å/min/gun (Cu) in our co-sputtering geometry. Demonstrated co-sputtering deposition ratios up to 100:1 allow accurate tuning of magnetic dopant concentration and eliminate the difficulty of preparing homogeneous alloy targets of extreme dilution.
- Subjects
CALORIMETERS; PARAMAGNETISM; SPUTTERING (Physics); THIN films; MAGNETIC devices; ALLOYS; DOPING agents (Chemistry)
- Publication
Journal of Low Temperature Physics, 2012, Vol 167, Issue 3/4, p286
- ISSN
0022-2291
- Publication type
Article
- DOI
10.1007/s10909-012-0564-0