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- Title
The development of a monitoring system for analyzing factors affecting film thickness in a sputtering process.
- Authors
Chou, Cheng-Hsueh; Lin, You-Teh; Shinde, Swapnil; Huang, Ci-En; Wu, Tsung-Chien; Lin, Keh-Moh; Hsiao, Wen-Tse
- Abstract
Since semiconductor technology has been progressing, an approach to precise size control of the devices becomes a main challenge. In this work, a programmable logic controller module was used to read the sputtering parameters in real time. Experimental results confirmed that the direct current (DC) bias increased with increasing sputtering power. At the same time, the non-uniformity of the deposited films also increased along with the increasing power. However, the film thickness difference caused by plasma turbulence decreased with increasing deposition time. In addition, it was difficult to evaluate the local uniformity of the film by using the DC bias.
- Subjects
PROGRAMMABLE controllers; PLASMA turbulence; SEMICONDUCTOR films; SYSTEMS development; SEMICONDUCTOR technology; TRANSCRANIAL direct current stimulation
- Publication
Modern Physics Letters B, 2020, Vol 34, Issue 7-9, pN.PAG
- ISSN
0217-9849
- Publication type
Article
- DOI
10.1142/S0217984920400217