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- Title
Covalent Patterning of 2D MoS<sub>2</sub>.
- Authors
Chen, Xin; Kohring, Malte; Assebban, M'hamed; Tywoniuk, Bartłomiej; Bartlam, Cian; Moses Badlyan, Narine; Maultzsch, Janina; Duesberg, Georg S.; Weber, Heiko B.; Knirsch, Kathrin C.; Hirsch, Andreas
- Abstract
The development of an efficient method to patterning 2D MoS2 into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS2 ribbon patterns with a minimum feature size of 2 μm in a high throughput rate. The patterned monolayer MoS2 domain consists of a spatially well‐defined heterophase homojunction and alternately distributed surface characteristics, which holds great interest for further exploration of MoS2 based devices.
- Subjects
ELECTRON beam lithography; ELECTRON beams; MONOMOLECULAR films
- Publication
Chemistry - A European Journal, 2021, Vol 27, Issue 52, p13117
- ISSN
0947-6539
- Publication type
Article
- DOI
10.1002/chem.202102021