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- Title
Plasma pretreatment of polycarbonate substrates for indium zinc oxide film deposition.
- Authors
Zhang, Xuan; Lang, Jianlin; Yan, Yue; Zhang, Xiaofeng; Zhong, Yanli; Li, Lei
- Abstract
The influence of plasma treatment of polycarbonate (PC) substrates on the morphological, electrical, and adhesion properties of deposited amorphous transparent indium zinc oxide (IZO) by direct current magnetron sputtering was investigated by analyzing atomic force microscopy, contact angles, Hall, and nano-scratch measurements. The surfaces of PC substrates were performed by plasma treatment at various processing times in Ar/O2 mix atmosphere. The atomic force microscopy images indicated that the microstructure of the substrates considerably influenced the surface morphology of deposited IZO films, and the least surface roughness of IZO was obtained after 5-s plasma treatment. The IZO film deposited on PC with 5-s plasma treatment presented an improved electrical conductivity and thermal stability after annealing at 120 °C in air, whereas the significant decrease in carrier concentration and increase in resistivity with extending plasma treatment time were observed, which was attributed to the elevated oxygen adsorption during annealing for a loosely packed structure. Moreover, the adhesion properties of IZO films with PC substrates decreased after 30-s plasma treatment because of the significant difference on the surface polarity between the PC and thin films and the increased roughness caused by plasma etching. Copyright © 2016 John Wiley & Sons, Ltd.
- Subjects
POLYCARBONATES; INDIUM oxide; ZINC oxide; OXIDE coating; MAGNETRON sputtering
- Publication
Surface & Interface Analysis: SIA, 2017, Vol 49, Issue 5, p376
- ISSN
0142-2421
- Publication type
Article
- DOI
10.1002/sia.6142