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- Title
NANOSCALE ARRAYS IN LITHIUM NIOBATE FABRICATED BY INTERFERENCE LITHOGRAPHY AND DRY ETCHING.
- Authors
SI, G. Y.; DANNER, A. J.; TENG, J. H.; ANG, S. S.; CHEW, A. B.; DOGHECHE, E.
- Abstract
Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques.
- Subjects
NANOTECHNOLOGY; LITHIUM niobate; PLASMA etching; PHOTOLITHOGRAPHY; ELECTRON beams; SCANNING electron microscopy; NANOSTRUCTURES; WAVELENGTHS
- Publication
International Journal of Nanoscience, 2010, Vol 9, Issue 4, p311
- ISSN
0219-581X
- Publication type
Article
- DOI
10.1142/S0219581X10006867