Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleAcid-catalyzed single-layer resists for ArF lithography.AuthorsKunz, Roderick R.; Allen, Robert D.; Hinsberg, William D.; Wallraff, Gregory M.PublicationOptical Engineering, 1993, Vol 32, Issue 10, p2363ISSN0091-3286Publication typeArticleDOI10.1117/12.145955