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- Title
Structural and optical properties of nanocrystalline WO thin films.
- Authors
Srinivasa Rao, K.; Rajini Kanth, B.; Srujana Devi, G.; Mukhopadhyay, P. K.
- Abstract
The nanocrystalline WO thin films were deposited by r.f. magnetron sputtering on quartz and p- type Si (100) substrates at a constant power of 25 W and at three different sputtering pressures (0.05, 0.01 and 0.5 mbar) and post annealed at different temperatures. The deposited films were characterized by XRD, UV-VIS spectrophotometry, ellipsometry and atomic force microscopy (AFM). The structural studies from XRD spectra reveals that the films deposited at 0.05 mbar and post annealed at 573 and 673 K have the predominant orthorhombic phase, whereas at 0.1 mbar and 573, 673 K triclinic phase is predominant. When sputtering pressure is at 0.5 mbar the predominant phase is monoclinic when annealed at 473 K and triclinic at 673 K. The optical energy gap is influenced significantly by sputtering pressure and post annealing temperatures. The optical energy gap of the films deposited at higher sputtering pressures and post annealed at lower temperatures is high due to smaller crystallite sizes. The thickness of all deposited films at different conditions is around 200 nm.
- Subjects
OPTICAL properties; NANOCRYSTALS; THIN films; MAGNETRON sputtering; QUARTZ; ATOMIC force microscopy
- Publication
Journal of Materials Science: Materials in Electronics, 2011, Vol 22, Issue 9, p1466
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-011-0331-z