We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers.
- Authors
Jiang, Bowen; Guan, Jie; Zhao, Peng; Chen, Yulin; Zhang, Zefang
- Abstract
The use of surfactants is crucial in the chemical–mechanical polishing fluid system for silicon wafers. This paper examines the impact of the functional group structure of polyoxyethylene-based nonionic surfactants and the variation in the polyoxyethylene (EO) addition number on the polishing performance of monocrystalline silicon wafers, to achieve the appropriate material removal rate and surface quality. The results demonstrated that the straight-chain structure of fatty alcohol polyoxyethylene ether (AEO-9) exhibited superior performance in wafer polishing compared to octylphenol polyoxyethylene ether (OP-9) and isoprenol polyoxyethylene ether (TPEG) and polyethylene glycol (PEG). By varying the number of EO additions of AEO-type surfactants, this study demonstrated that the polishing performance of monocrystalline silicon wafers was affected by the number of EO additions. The best polishing effect was achieved when the number of EO additions was nine. The mechanism of the role of polyoxyethylene-type nonionic surfactants in silicon wafer polishing was derived through polishing experiments, the contact angle, abrasive particle size analysis, zeta potential measurement, XPS, and other means of characterization.
- Subjects
SILICON wafers; CONTACT angle; FATTY alcohols; POLYETHYLENE glycol; ZETA potential; NONIONIC surfactants; GRINDING &; polishing
- Publication
Crystals (2073-4352), 2024, Vol 14, Issue 5, p460
- ISSN
2073-4352
- Publication type
Article
- DOI
10.3390/cryst14050460