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- Title
Determination of the Parameters of Multilayer Nanostructures Using Two-Wave X-ray Reflectometry.
- Authors
Popov, N. L.; Uspenskiı, Yu. A.; Turyanskiı, A. G.; Pirshin, I. V.; Vinogradov, A. V.; Platonov, Yu. Ya.
- Abstract
A method for determining the parameters of multilayer nanostructures by measuring the angular dependence of the X-ray reflectance at two wavelengths has been considered. A calculation scheme taking into account the specificity of the method was suggested, which allows operation with samples of any size and shape. The scheme was applied to C/Ni/C, Si[sub1 -x]Ge[SUBx], and Al[SUBx]Ga[SUB1-x] As multilayer structures. It was shown that) two-wave reflectometry allows elimination of the influence of instrumental errors; hence, the thickness, density, and composition of both polycrystalline and monocrystalline nanostructure layers reliably determined.
- Subjects
NANOSTRUCTURES; PARAMETER estimation; X-rays; REFLECTANCE
- Publication
Semiconductors, 2003, Vol 37, Issue 6, p675
- ISSN
1063-7826
- Publication type
Article
- DOI
10.1134/1.1582534