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- Title
EUV lithography: Lithography gets extreme.
- Authors
Wagner, Christian; Harned, Noreen
- Abstract
The article discusses the extreme ultraviolet lithography (EUV), a method of producing low-cost but more-advanced integrated circuits which expands its photolithography to a much shorter wavelengths. EUV uses radiation of 13.5 nanometers wavelenghts, thus offering significant potential to make the resolution of photolithography larger. EUV can accomplish resolutions with a single exposure and with less limitations on design, increasing wafer and cutting down the cost of manufacturing.
- Subjects
EXTREME ultraviolet lithography; PHOTOLITHOGRAPHY; LARGE scale integration of circuits; WAVELENGTHS; RADIATION
- Publication
Nature Photonics, 2010, Vol 4, Issue 1, p24
- ISSN
1749-4885
- Publication type
Article
- DOI
10.1038/nphoton.2009.251