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- Title
Optical spectrometry in the diagnosis of ion-plasma processes.
- Authors
Kostrin, D. K.; Uhov, A. A.; Lisenkov, A. A.
- Abstract
At the present stage of progress the development of ion-plasma technological devices requires the use of express analysis of the generated plasma flux composition. Spectrometric equipment which can be embedded into the technological process to determine the composition of the gas mixture and to analyze the emission spectra of low temperature plasma generated by magnetron sputtering systems and vacuum arc sources is presented. The method of spectral interferometry that allows to control thickness and refractive index of the deposited films with depth from fractions to hundreds of micrometers is described.
- Subjects
OPTICAL spectrometers; PLASMA flux measurement; SPECTRUM analysis; GAS mixtures; MAGNETRON sputtering; THIN film deposition; EMISSION spectroscopy
- Publication
Vakuum in Forschung und Praxis, 2016, Vol 28, Issue 3, p34
- ISSN
0947-076X
- Publication type
Article
- DOI
10.1002/vipr.201600608