We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography.
- Authors
H. Okayama; D. Shimura; Y. Onawa; H. Takahashi; M. Seki; K. Koshino; N. Yokoyama; M. Oshtsuka; T. Tsuchizawa; Nishi, H.; K. Yamada; H. Yaegashi; T. Horikawa; H. Sasaki
- Abstract
A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of -23 dB was obtained.
- Subjects
WAVEGUIDES; EXCIMERS; IMMERSION lithography; MICROELECTRONICS; MICROLITHOGRAPHY
- Publication
Electronics Letters (Wiley-Blackwell), 2013, Vol 49, Issue 22, p1401
- ISSN
0013-5194
- Publication type
Article
- DOI
10.1049/el.2013.2979