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On the Critical Exponents of Certain Nonlinear Boundary-Value Problems with Biharmonic Operator in the Exterior of a Ball.
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- Mathematical Notes, 2006, v. 79, n. 1/2, p. 185, doi. 10.1007/s11006-006-0022-x
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Chemical Vapor Deposition of Silicon Nanoparticles on the Surface of Multiwalled Carbon Nanotubes.
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- Journal of Structural Chemistry, 2020, v. 61, n. 4, p. 617, doi. 10.1134/S0022476620040162
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Study of Behavioral Parameters during Learning of Rats in an Operant Feeding Task and Evaluation of Biochemical Indexes after Dietary Consumption of the Phytoecdysteroid Extract.
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- Bulletin of Experimental Biology & Medicine, 2014, v. 158, n. 1, p. 4, doi. 10.1007/s10517-014-2678-7
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Real Structures of Doped Lead Telluride Crystals.
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- Crystallography Reports, 2002, v. 47, n. 7, p. S128, doi. 10.1134/1.1529967
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Synthesis and Study of Bismuth(III) Oxalates Precipitated from Mineral Acid Solutions.
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- Russian Journal of General Chemistry, 2023, v. 93, n. 9, p. 2295, doi. 10.1134/S1070363223090116
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De Novo Transcriptome Profiling of Brain Tissue from the Annual Killifish Nothobranchius guentheri.
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- Life (2075-1729), 2021, v. 11, n. 2, p. 137, doi. 10.3390/life11020137
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Aluminum-induced crystallization of silicon suboxide thin films.
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- Applied Physics A: Materials Science & Processing, 2018, v. 124, n. 9, p. 1, doi. 10.1007/s00339-018-2070-y
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Raman scattering spectroscopy of inclusions of carbon in AlO films and its solid solutions with HfO.
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- Optics & Spectroscopy, 2011, v. 110, n. 1, p. 55, doi. 10.1134/S0030400X11010188
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Ellipsometry of GeO<sub>2</sub> films with Ge nanoclusters: Influence of the quantum-size effect on refractive index.
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- Optics & Spectroscopy, 2009, v. 106, n. 3, p. 436, doi. 10.1134/S0030400X09030205
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Growth of Silicene by Molecular Beam Epitaxy on CaF<sub>2</sub>/Si(111) Substrates Modified by Electron Irradiation.
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- JETP Letters, 2024, v. 119, n. 9, p. 703, doi. 10.1134/S0021364024600599
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Synthesis of Epitaxial Structures with Two-Dimensional Si Layers Embedded in a CaF<sub>2</sub> Dielectric Matrix.
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- JETP Letters, 2022, v. 116, n. 9, p. 628, doi. 10.1134/S0021364022602159
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Culturable Bacterial Endophytes of Wild White Poplar (Populus alba L.) Roots: A First Insight into Their Plant Growth-Stimulating and Bioaugmentation Potential.
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- Biology (2079-7737), 2023, v. 12, n. 12, p. 1519, doi. 10.3390/biology12121519
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Diffusion of Germanium from a Buried SiO<sub>2</sub> Layer and Formation of a SiGe Phase.
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- Semiconductors, 2022, v. 56, n. 3, p. 215, doi. 10.1134/S1063782622020154
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Atomic Structure and Optical Properties of CaSi<sub>2</sub> Layers Grown on CaF<sub>2</sub>/Si Substrates.
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- Semiconductors, 2021, v. 55, n. 10, p. 808, doi. 10.1134/S1063782621090268
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Structure of Germanium Monoxide Thin Films.
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- Semiconductors, 2020, v. 54, n. 12, p. 1555, doi. 10.1134/S1063782620120027
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Effect of Interfaces and Thickness on the Crystallization Kinetics of Amorphous Germanium Films.
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- Semiconductors, 2020, v. 54, n. 7, p. 754, doi. 10.1134/S1063782620070040
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On the Formation of Amorphous Ge Nanoclusters and Ge Nanocrystals in GeSixOy Films on Quartz Substrates by Furnace and Pulsed Laser Annealing.
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- Semiconductors, 2020, v. 54, n. 3, p. 322, doi. 10.1134/S1063782620030070
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Study of Structural Modification of Composites with Ge Nanoclusters by Optical and Electron Microscopy Methods.
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- Semiconductors, 2019, v. 53, n. 16, p. 2064, doi. 10.1134/S1063782619120030
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Luminescence Properties of FZ Silicon Irradiated with Swift Heavy Ions.
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- Semiconductors, 2019, v. 53, n. 11, p. 1427, doi. 10.1134/S1063782619110046
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Some Physical Properties of the New Intermetallic Compound NbCd<sub>2</sub>.
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- Semiconductors, 2019, v. 53, n. 8, p. 1028, doi. 10.1134/S1063782619080219
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Raman Scattering in InSb Spherical Nanocrystals Ion-Synthesized in Silicon-Oxide Films.
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- Semiconductors, 2019, v. 53, n. 4, p. 493, doi. 10.1134/S1063782619040262
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Crystallization of Amorphous Germanium Films and Multilayer a-Ge/a-Si Structures upon Exposure to Nanosecond Laser Radiation.
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- Semiconductors, 2019, v. 53, n. 3, p. 400, doi. 10.1134/S1063782619030217
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On the Formation of IR-Light-Emitting Ge Nanocrystals in Ge:SiO<sub>2</sub> Films.
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- Semiconductors, 2018, v. 52, n. 9, p. 1178, doi. 10.1134/S1063782618090233
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Forbidden Resonant Raman Scattering in GaAs/AlAs Superlattices: Experiment and Calculations.
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- Semiconductors, 2018, v. 52, n. 6, p. 717, doi. 10.1134/S1063782618060234
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New Method of Porous Ge Layer Fabrication: Structure and Optical Properties.
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- Semiconductors, 2018, v. 52, n. 5, p. 628, doi. 10.1134/S1063782618050111
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Ion-Beam Synthesis of the Crystalline Ge Phase in SiON Films upon Annealing under High Pressure.
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- Semiconductors, 2018, v. 52, n. 2, p. 268, doi. 10.1134/S1063782618020215
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Formation and study of p-i-n structures based on two-phase hydrogenated silicon with a germanium layer in the i-type region.
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- Semiconductors, 2017, v. 51, n. 10, p. 1370, doi. 10.1134/S1063782617100128
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Specific features of the ion-beam synthesis of Ge nanocrystals in SiO thin films.
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- Semiconductors, 2017, v. 51, n. 9, p. 1240, doi. 10.1134/S1063782617090226
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Optical properties of p-i-n structures based on amorphous hydrogenated silicon with silicon nanocrystals formed via nanosecond laser annealing.
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- Semiconductors, 2016, v. 50, n. 7, p. 935, doi. 10.1134/S1063782616070101
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Effect of hydrostatic pressure during the annealing of silicon-on-insulator films implanted with a high hydrogen-ion dose.
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- Semiconductors, 2014, v. 48, n. 10, p. 1303, doi. 10.1134/S1063782614100285
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Comparison of various methods for transferring graphene and few layer graphene grown by chemical vapor deposition to an insulating SiO/Si substrate.
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- Semiconductors, 2014, v. 48, n. 6, p. 804, doi. 10.1134/S1063782614060049
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Raman scattering in PbTe and PbSnTe films: In situ phase transformations.
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- Semiconductors, 2014, v. 48, n. 2, p. 173, doi. 10.1134/S1063782614020298
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Crystallization induced by thermal annealing with millisecond pulses in silicon-on-insulator films implanted with high doses of hydrogen ions.
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- Semiconductors, 2013, v. 47, n. 5, p. 606, doi. 10.1134/S1063782613050229
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Influence of irradiation with swift heavy ions on multilayer Si/SiO heterostructures.
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- Semiconductors, 2013, v. 47, n. 3, p. 358, doi. 10.1134/S1063782613030111
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Quantum-confinement effect in silicon-on-insulator films implanted with high doses of hydrogen ions.
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- Semiconductors, 2012, v. 46, n. 10, p. 1286, doi. 10.1134/S1063782612100181
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Formation of light-emitting nanostructures in layers of stoichiometric SiO irradiated with swift heavy ions.
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- Semiconductors, 2011, v. 45, n. 10, p. 1311, doi. 10.1134/S1063782611100113
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Crystallization of hydrogenated amorphous silicon films by exposure to femtosecond pulsed laser radiation.
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- Semiconductors, 2011, v. 45, n. 2, p. 265, doi. 10.1134/S1063782611020254
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Formation and crystallization of silicon nanoclusters in SiN:H films using femtosecond pulsed laser annealings.
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- Semiconductors, 2010, v. 44, n. 12, p. 1611, doi. 10.1134/S1063782610120146
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X-ray and infrared spectroscopy of layers produced by cosputtering of spatially separated SiO<sub>2</sub> and Si sources.
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- Semiconductors, 2010, v. 44, n. 4, p. 531, doi. 10.1134/S1063782610040214
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Structure and optical properties of SiN<sub> x</sub>: H films with Si nanoclusters produced by low-frequency plasma-enhanced chemical vapor deposition.
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- Semiconductors, 2009, v. 43, n. 11, p. 1514, doi. 10.1134/S1063782609110207
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Effect of the ion-energy loss rate on defect formation during implantation in silicon nanocrystals.
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- Semiconductors, 2008, v. 42, n. 9, p. 1127, doi. 10.1134/S1063782608090224
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SiO<sub> x </sub> layer formation during plasma sputtering of Si and SiO<sub>2</sub> targets.
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- Semiconductors, 2008, v. 42, n. 6, p. 731, doi. 10.1134/S106378260806016X
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Effect of high-power nanosecond and femtosecond laser pulses on silicon nanostructures.
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- Semiconductors, 2008, v. 42, n. 2, p. 183, doi. 10.1134/S1063782608020103
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Variation in optical-absorption edge in SiN<sub> x </sub> layers with silicon clusters.
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- Semiconductors, 2008, v. 42, n. 2, p. 202, doi. 10.1134/S1063782608020152
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Determination of the composition and strains in Ge<sub>x</sub>Si<sub>1− x </sub>-based nanostructures from Raman spectroscopy data with consideration of the contribution of the heterointerface.
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- Semiconductors, 2007, v. 41, n. 8, p. 930, doi. 10.1134/S106378260708012X
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Determination of the composition and stresses in Ge<sub>x</sub>Si<sub>(1− x)</sub> heterostructures from Raman spectroscopy data: Refinement of model parameters.
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- Semiconductors, 2006, v. 40, n. 11, p. 1314, doi. 10.1134/S106378260611011X
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Electrical properties and photoluminescence of SiO<sub>x</sub> layers with Si nanocrystals in relation to the SiO<sub>x</sub> composition.
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- Semiconductors, 2006, v. 40, n. 10, p. 1198, doi. 10.1134/S1063782606100137
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Modification of quantum dots in Ge/Si nanostructures by pulsed laser irradiation.
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- Semiconductors, 2006, v. 40, n. 2, p. 202, doi. 10.1134/S1063782606020175
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Effect of Quantum Confinement on Optical Properties of Ge Nanocrystals in GeO<sub>2</sub> Films.
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- Semiconductors, 2005, v. 39, n. 10, p. 1168, doi. 10.1134/1.2085265
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Coulomb Blockade of the Conductivity of SiO<sub>x</sub> Films Due to One-Electron Charging of a Silicon Quantum Dot in a Chain of Electronic States.
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- Semiconductors, 2005, v. 39, n. 8, p. 910, doi. 10.1134/1.2010684
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