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- Title
Thermodynamic modeling of BCN chemical vapor deposition from N-trimethylborazine + ammonia mixtures.
- Authors
Golubenko, A.; Kosinova, M.; Titov, A.; Kuznetsov, F.
- Abstract
Low-pressure (13.3 and 1.33 Pa) chemical vapor deposition in the B-C-N-H and B-C-N-H-O systems from N-trimethylborazine + ammonia mixtures has been analyzed in a wide range of deposition temperatures, 300-1300 K, using thermodynamic modeling. The results indicate that the presence of oxygen adds significant complexity to the composition of condensed phases. We have examined the feasibility of producing films of various compositions and determined deposition conditions. Oxygen-free deposits can be obtained at high temperatures. At temperatures of 600 and 700 K, the limiting composition of the condensed phase, B: N: C = 1: 1: 1, can be reached at a total pressure in the system of 1.33 and 13.3 Pa, respectively.
- Subjects
CHEMICAL vapor deposition; THERMODYNAMICS; BORAZINE; AMMONIA; BINARY mixtures; TEMPERATURE effect; CONDENSATION; HIGH temperatures
- Publication
Inorganic Materials, 2012, Vol 48, Issue 7, p691
- ISSN
0020-1685
- Publication type
Article
- DOI
10.1134/S0020168512060039