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- Title
Ultra-smooth platinum surfaces for nanoscale devices fabricated using chemical mechanical polishing.
- Authors
Islam, M. Saif; Jung, G.Y.; Ha, T.; Stewart, D.R.; Chen, Y.; Wang, S.Y.; Williams, R. Stanley
- Abstract
A technique involving two steps of chemical mechanical polishing (CMP) has been developed to produce ultra-smooth metal surfaces with an RMS roughness better than 0.1 nm. A figure of merit termed degree of smoothness (DOS) is proposed for the purpose of quantifying the extent of smoothness of a polished metal surface. A post CMP metal slurry cleaning solution was used for cleaning Pt slurry for the first time and by applying special techniques, a very high quality clean surface was attained. Applications of the polished Pt electrodes in interfacing molecular switching devices with self-assembled monolayers of molecules have been found to dramatically improve the packing and orientation of the molecular monolayer with a huge improvement in the molecular electronics device yields. These smooth metal surfaces may open doors for new opportunities in future nanoscale devices.
- Subjects
NANOTECHNOLOGY; MOLECULAR electronics; ELECTRIC resistors; MONOMOLECULAR films; SURFACE chemistry; MOLECULAR dynamics
- Publication
Applied Physics A: Materials Science & Processing, 2005, Vol 80, Issue 6, p1385
- ISSN
0947-8396
- Publication type
Article
- DOI
10.1007/s00339-004-3170-4