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- Title
Next-generation lithography: Making a good impression.
- Authors
Kreindl, Gerald; Glinsner, Thomas; Miller, Ron
- Abstract
The article reports on nano-imprint lithography (NIL), a method used to fabricate nanometre-scale patterns that offers less precise overlay arrangement, can launch bigger particle contamination, and functions outputs at a lower cost. NIL is limited in a particular area because it is a contact technology, not a projection-based technology. It notes that NIL will have an important role in expanding the needs of consumer both commercial and industrial by allowing manufacture of HB-LEDs at low cost.
- Subjects
LITHOGRAPHY; NANOELECTROMECHANICAL systems; PARTICULATE matter; NANOPARTICLES; LIGHT absorption
- Publication
Nature Photonics, 2010, Vol 4, Issue 1, p27
- ISSN
1749-4885
- Publication type
Article
- DOI
10.1038/nphoton.2009.252