Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleProperties of Si<sub>3</sub>N<sub>4</sub> and AIN Films Produced by Reactive Ion Plating and Gas Discharge Sputtering.AuthorsMonz, K. H.; Danh, Nguyen Quang; Huter, M.; Rille, E. P.; Pulker, H. K.PublicationVakuum in Forschung und Praxis, 1995, Vol 7, Issue 3, p221ISSN0947-076XPublication typeArticleDOI10.1002/vipr.19950070311