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- Title
Thickness and coverage determination of multilayer with an island-like overlayer by hard X-ray photoelectron spectroscopy at multiple photon energies.
- Authors
Isomura, N.; Kataoka, K.; Horibuchi, K.; Dohmae, K.; Oji, H.; Cui, Y.‐T.; Son, J.‐Y.; Kitazumi, K.; Takahashi, N.; Kimoto, Y.
- Abstract
To obtain depth profiles of the elemental composition of materials, we propose the use of hard X-ray photoelectron spectroscopy (HAXPES) over a range of incident photon energies (PEs). Photoelectron intensities are measured as a function of PE and take-off angle (TOA) from a multilayer sample (Au/SiO2/Si). The top layer of the sample (Au) formed an island-like structure, which we modeled as bumps and dips (surface roughness). The PE dependence, measured at angles close to the surface normal, is consistent with the theoretical results, in contrast to the TOA dependence. The Au coverage and layer thicknesses are calculated by curve fitting using experimental and theoretical results. Copyright © 2014 John Wiley & Sons, Ltd.
- Subjects
X-ray photoelectron spectroscopy; MULTIPHOTON processes; PHOTOELECTRON spectra; SURFACE roughness; CURVE fitting
- Publication
Surface & Interface Analysis: SIA, 2015, Vol 47, Issue 2, p265
- ISSN
0142-2421
- Publication type
Article
- DOI
10.1002/sia.5701