We found a match
Your institution may have access to this item. Find your institution then sign in to continue.
- Title
A three-dimensional optical photonic crystal with designed point defects.
- Authors
Qi, Minghao; Lidorikis, Elefterios; Rakich, Peter T.; Johnson, Steven C.; Joannopoulos, J. D.; Ippen, Erich P.; Smith, Henry L.
- Abstract
Photonic crystals offer unprecedented opportunities for miniaturization and integration of optical devices. They also exhibit a variety of new physical phenomena, including suppression or enhancement of spontaneous emission, low-threshold lasing, and quantum information processing. Various techniques for the fabrication of three-dimensional (3D) photonic crystals-such as silicon micromachining, wafer fusion bonding, holographic lithography, self-assembly, angled-etching, micromanipulation, glancing-angle deposition and auto-cloning-have been proposed and demonstrated with different levels of success. However, a critical step towards the fabrication of functional 3D devices, that is, the incorporation of microcavities or waveguides in a controllable way, has not been achieved at optical wavelengths. Here we present the fabrication of 3D photonic crystals that are particularly suited for optical device integration using a lithographic layer-by-layer approach. Point-defect microcavities are introduced during the fabrication process and optical measurements show they have resonant signatures around telecommunications wavelengths (1.3-1.5?µm). Measurements of reflectance and transmittance at near-infrared are in good agreement with numerical simulations.
- Subjects
PHOTONICS; OPTOELECTRONIC devices; CRYSTALS; LITHOGRAPHY; PLASMA waveguides; MICROMACHINING
- Publication
Nature, 2004, Vol 429, Issue 6991, p538
- ISSN
0028-0836
- Publication type
Article
- DOI
10.1038/nature02575