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- Title
Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering.
- Authors
Shayapov, Vladimir R.; Bogoslovtseva, Alena L.; Chepkasov, Sergey Yu.; Asanov, Igor P.; Maksimovskiy, Evgeny A.; Kapishnikov, Aleksandr V.; Mironova, Maria I.; Lapega, Alina V.; Geydt, Pavel V.
- Abstract
The chemical composition, structure, and physical properties of aluminum nitride (AlN) films obtained using pulsed DC reactive magnetron sputtering in asymmetric bipolar mode have been studied. X-ray diffraction and electron diffraction confirmed the composition of c–axis textured hexagonal AlN films required for piezoelectric applications. The surface of the films obtained is quite smooth; the arithmetic average roughness does not exceed 2 nm. Transmission electron microscopy has shown the presence of a transition layer at the film–substrate interface. Transmission electron microscopy and X-ray photoelectron spectroscopy depth profile analysis have shown that the films have an oxidized surface layer which has an influence on the optical model of the films derived from ellipsometric data. However, it does not significantly influence the films' piezoresponse. Piezoelectric force microscopy indicated a piezoelectric effect in the films that is uniform over their surface.
- Subjects
MAGNETRON sputtering; REACTIVE sputtering; MAGNETRONS; X-ray photoelectron spectroscopy; PIEZOELECTRICITY; ALUMINUM nitride
- Publication
Coatings (2079-6412), 2023, Vol 13, Issue 7, p1281
- ISSN
2079-6412
- Publication type
Article
- DOI
10.3390/coatings13071281