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- Title
Syntheses of η¹-Alkyl-η³ -Allyl-η<sup>5</sup> -Cyclopentadienyl Cobalt(III) Complexes and Their Use in Low-temperature Atomic Layer Deposition of Cobalt-Containing Thin Films.
- Authors
Ke Lu; Jiahao Zhu; Jialiang Wang; Qingbo Wa; Zheng Guo; Wei Xiong; Yuan Gao; Renbo Lei; Bichu Cheng; Xinwei Wang
- Abstract
Herein, we report the design and scalable synthesis of three new Co(III) complexes, which have an unusual hydrocarbon η¹ -alkyl-η³ -allyl-η5 -cyclopentadienyl ligation structure, from the reactions of readily available cobalt(II) compound CoCl2 (PPh3)2 and biomass material β-pinene via C-C bond activation. These Co(III) complexes are air-stable, fairly volatile, and thermally stable, so they are excellent candidates as the metal precursors for the vapor deposition of cobalt-containing thin films. As a demonstration, we show that the Co(III) complex of [(3'-5'-η,1-σ)-methylene(2,2,4-trimethyl-4-cyclohexene-1,3-diyl)](η5 -methylcyclopentadienyl)Co (i. e. (seco-pinene)(MeCp)Co) is well suited for the atomic layer deposition (ALD) of Co3 O4 and CoS2 thin films, and the deposited Co3 O4 and CoS2 films are able to conformally cover trench structures with a fairly high aspect ratio of 10: 1.
- Subjects
ATOMIC layer deposition; COBALT compounds; THIN film deposition; VAPOR-plating; COBALT; THIN films; METAL vapors
- Publication
Chemistry - A European Journal, 2023, Vol 29, Issue 16, p1
- ISSN
0947-6539
- Publication type
Article
- DOI
10.1002/chem.202203656