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- Title
3D NAND Flash Memory Based on Double-Layer NC-Si Floating Gate with High Density of Multilevel Storage.
- Authors
Yu, Xinyue; Ma, Zhongyuan; Shen, Zixiao; Li, Wei; Chen, Kunji; Xu, Jun; Xu, Ling
- Abstract
As a strong candidate for computing in memory, 3D NAND flash memory has attracted great attention due to the high computing efficiency, which outperforms the conventional von-Neumann architecture. To ensure 3D NAND flash memory is truly integrated in the computing in a memory chip, a new candidate with high density and a large on/off current ratio is now urgently needed. Here, we first report that 3D NAND flash memory with a high density of multilevel storage can be realized in a double-layered Si quantum dot floating-gate MOS structure. The largest capacitance–voltage (C-V) memory window of 6.6 V is twice as much as that of the device with single-layer nc-Si quantum dots. Furthermore, the stable memory window of 5.5 V can be kept after the retention time of 105 s. The obvious conductance–voltage (G-V) peaks related to the charging process can be observed, which further confirms that the multilevel storage can be realized in double-layer Si quantum dots. Moreover, the on/off ratio of 3D NAND flash memory with a nc-Si floating gate can reach 104, displaying the characteristic of a depletion working mode of an N-type channel. The memory window of 3 V can be maintained after 105 P/E cycles. The programming and erasing speed can arrive at 100 µs under the bias of +7 V and −7 V. Our introduction of double-layer Si quantum dots in 3D NAND float gating memory supplies a new way to the realization of computing in memory.
- Subjects
FLASH memory; QUANTUM dots; RF values (Chromatography); STORAGE; NAND gates; DENSITY
- Publication
Nanomaterials (2079-4991), 2022, Vol 12, Issue 14, pN.PAG
- ISSN
2079-4991
- Publication type
Article
- DOI
10.3390/nano12142459