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- Title
Laser-plasma extreme ultraviolet source at 6.7 nm using a rotating cryogenic Xe target.
- Authors
Amano, Sho; Inoue, Tomoaki
- Abstract
A laser-plasma source comprising a rotating cryogenic solid-state Xe target has been studied for use in extreme ultraviolet lithography (EUVL) systems equipped with La/BC mirrors. The laser-to-EUV power conversion efficiency (CE) of the cryogenic Xe target was improved to achieve a maximum CE of 0.15 % at 6.7 nm with 0.6 % bandwidth. We successfully demonstrated the continuous generation of EUV light with an average power of 80 mW at 6.7 nm with 0.6 % bandwidth using a Nd:YAG slab laser at a repetition rate of 320 Hz and an average power of 100 W. Scaling-up of the laser-plasma source for use as a future EUVL source is also discussed.
- Subjects
LASER plasmas; EXTREME ultraviolet lithography; LOW temperature engineering; XENON; BANDWIDTHS; ND-YAG lasers; SOLID-state lasers
- Publication
Applied Physics B: Lasers & Optics, 2012, Vol 108, Issue 4, p743
- ISSN
0946-2171
- Publication type
Article
- DOI
10.1007/s00340-012-5215-2