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- Title
Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow.
- Authors
Sedov, Vadim; Popovich, Alexey; Linnik, Stepan; Martyanov, Artem; Wei, Junjun; Zenkin, Sergei; Zavedeev, Evgeny; Savin, Sergey; Gaydaychuk, Alexander; Li, Chengming; Ralchenko, Victor; Konov, Vitaly
- Abstract
A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m·K in comparison to 130 W/m·K for the 93 µm-thick pure HF CVD film.
- Subjects
DIAMOND films; CHEMICAL vapor deposition; THERMAL conductivity; MICROWAVE plasmas; ELECTRON field emission; THIN films
- Publication
Coatings (2079-6412), 2023, Vol 13, Issue 2, p380
- ISSN
2079-6412
- Publication type
Article
- DOI
10.3390/coatings13020380