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- Title
Large-scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV-nanoimprint lithography.
- Authors
Cui, Lin; Han, Jie-Cai; Wang, Gui-Gen; Zhang, Hua-Yu; Sun, Rui; Li, Ling-Hua
- Abstract
Large-scale nanopatterned sapphire substrates were fabricated by annealing of patterned Al thin films. Patterned Al thin films were obtained by soft UV-nanoimprint lithography and reactive ion etching. The soft mold with 550-nm-wide lines separated by 250-nm space was composed of the toluene-diluted polydimethylsiloxane (PDMS) layer supported by the soft PDMS. Patterned Al thin films were subsequently subjected to dual-stage annealing due to the melting temperature of Al thin films (660°C). The first comprised a low-temperature oxidation anneal at 450°C for 24 h. This was followed by a high-temperature annealing in the range of 1,000°C and 1,200°C for 1 h to induce growth of the underlying sapphire single crystal to consume the oxide layer. The SEM results indicate that the patterns were retained on sapphire substrates after high-temperature annealing at less than 1,200°C. Finally, large-scale nanopatterned sapphire substrates were successfully fabricated by annealing of patterned Al thin films for 24 h at 450°C and 1 h at 1,000°C by soft UV-nanoimprint lithography.
- Subjects
SAPPHIRES; SUBSTRATES (Materials science); NANOLITHOGRAPHY; ANNEALING of metals; REACTIVE-ion etching; POLYDIMETHYLSILOXANE; LIGHT emitting diodes
- Publication
Nanoscale Research Letters, 2013, Vol 8, Issue 1, p1
- ISSN
1931-7573
- Publication type
Article
- DOI
10.1186/1556-276X-8-472