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- Title
Measurement of the layer thickness on rotating substrates in molecular-beam epitaxy apparatus.
- Authors
Aleksandrov, S. E.; Gavrilov, G. A.; Sotnikova, G. Yu.; Alekseev, A. N.; Baranov, D. A.; Shkurko, A. P.
- Abstract
A simple and effective method is developed for synchronous recording of an interference signal to measure the thickness of a layer grown on a rotating substrate in molecular_beam epitaxy apparatus. The separation of the information component of the signal from the noise induced by the rotation of a substrate (conditioning of the signal) increases the accuracy of recording the interference signal coming to a layer thickness calculation device and an automatic system of process management and, thus, increases the quality and reproducibility of film structures.
- Subjects
SUBSTRATES (Materials science); EPITAXY; NOISE; QUALITY; INTERFERENCE (Sound)
- Publication
Technical Physics, 2009, Vol 54, Issue 7, p1066
- ISSN
1063-7842
- Publication type
Article
- DOI
10.1134/S106378420907024X