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- Title
Contamination of Magnetron Sputtered Metallic Films by Oxygen From Residual Atmosphere in Deposition Chamber.
- Authors
Pokorný, Petr; Musil, Jindřich; Fitl, Přemysl; Novotný, Michal; Lančok, Jan; Bulíř, Jiří
- Abstract
The article reports on the contamination of Ag thin films sputtered from a pure Ag target in Ar and Ne gas by the RF magnetron by gas atoms contained in residual gas atmosphere in the deposition chamber at different values of the base pressure. The amount of O atoms generated at different values of base pressure is compared with the amount of Ag atoms sputtered at different deposition rates of Ag film. This comparison reveals a great problem in the formation of pure metallic films at low deposition rates and high values of the base pressure. No pure Ag films can be deposited at low in deposition chambers evacuated with diffusion or root pumps to the base pressures lower than 1 mPa only.
- Subjects
MAGNETRON sputtering; THIN film research; METAL coating; CHEMICAL vapor deposition; SILVER; METALLIC films
- Publication
Plasma Processes & Polymers, 2015, Vol 12, Issue 5, p416
- ISSN
1612-8850
- Publication type
Article
- DOI
10.1002/ppap.201400172