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Title
Lithography roadmap on track.
Abstract
The article reports on the message given at the EUVL and Immersion Extentions Symposia which covered the issues on extreme UV lithography (EUVL) and 193 nanometre immersion lithography. It also highlights a report from the laser developer, Cymer Inc. The EUVL Symposium Steering Committee has identified the successful adoption of EUVL for commercial manufacturing as one area that the industry must focus on.