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- Title
Synthesis of Narrow Molecular Weight Distribution Copolymers for ArF Photoresist Materials by Nitroxide Mediated Polymerization.
- Authors
Wang, Zi Jun; Wylie, Kevin; Marić, Milan
- Abstract
ArF candidate photoresist polymers have been synthesized by nitroxide mediated polymerization (NMP). Statistical copolymerizations of α-gamma butyrolactone methacrylate, 3-hydroxy-1-adamantyl methacrylate, and 2-methyl 2-adamantyl methacrylate with 5-10 mol% of controlling comonomers (i.e., styrene, p-acetoxystyrene, 2-vinyl naphthalene, acrylonitrile, and pentafluorostyrene), which are necessary for controlled polymerization of methacrylates by NMP with the unimolecular alkoxyamine initiator BlocBuilder, have been used. As little as 5 mol% controlling comonomer in the feed is demonstrated to be sufficient to produce linear evolution of number average molecular weight against conversion ( X) up to X = 0.7 for relatively low target degrees of polymerization. All of the resulting copolymers have relatively low dispersities
- Subjects
POLYMERIZATION; MOLECULAR weights; ARGON fluorides; COPOLYMERIZATION; METHACRYLATES
- Publication
Macromolecular Reaction Engineering, 2017, Vol 11, Issue 3, pn/a
- ISSN
1862-832X
- Publication type
Article
- DOI
10.1002/mren.201600029