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- Title
Total Ionizing Dose Effects of Si Vertical Diffused MOSFET with SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> Gate Dielectrics.
- Authors
Mo, Jiongjiong; Zhao, Xuran; Zhou, Min
- Abstract
The total ionizing dose irradiation effects are investigated in Si vertical diffused MOSFETs (VDMOSs) with different gate dielectrics including single SiO2 layer and double Si3N4/SiO2 layer. Radiation-induced holes trapping is greater for single SiO2 layer than for double Si3N4/SiO2 layer. Dielectric oxidation temperature dependent TID effects are also studied. Holes trapping induced negative threshold voltage shift is smaller for SiO2 at lower oxidation temperature. Gate bias during irradiation leads to different VTH shift for different gate dielectrics. Single SiO2 layer shows the worst negative VTH at VG=0 V, while double Si3N4/SiO2 shows negative VTH shift at VG=-5 V, positive VTH shift at VG=10 V, and negligible VTH shift at VG=0 V.
- Subjects
METAL oxide semiconductor field-effect transistors; IONIZING radiation dosage; SILICON oxide; GATE array circuits; DIELECTRICS; TEMPERATURE effect
- Publication
Active & Passive Electronic Components, 2017, p1
- ISSN
0882-7516
- Publication type
Article
- DOI
10.1155/2017/9685685