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- Title
Vacuum‐ultraviolet‐photoionization chamber for the investigation of ion‐based surface treatment and thin film deposition at atmospheric pressure.
- Authors
Sgonina, Kerstin; Schulze, Christian; Quack, Alexander; Benedikt, Jan
- Abstract
The vacuum‐ultraviolet‐photoionization chamber was constructed to allow controlled ion generation and well‐defined surface treatment with these ions at atmospheric pressure. It utilizes atmospheric helium plasma as a photon source and separates the ion generation from the plasma by an aerodynamic window. The ions are guided to the grounded substrate by a weak electric field, while the diffusive transport of neutrals is reduced by a helium gas flow along the substrate. Ionic species and the absolute ion flux were determined in the substrate region. Ion‐based thin film deposition using a C2H2 ${{\rm{C}}}_{2}{{\rm{H}}}_{2}$ precursor was investigated as a model process. The proposed system enables future investigation of e.g. the isolated interaction of ions with biological substrates.
- Subjects
THIN film deposition; INDUCTIVELY coupled plasma mass spectrometry; SURFACE preparation; ION sources; ATMOSPHERIC pressure
- Publication
Plasma Processes & Polymers, 2024, Vol 21, Issue 9, p1
- ISSN
1612-8850
- Publication type
Article
- DOI
10.1002/ppap.202400103