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- Title
Tunneling of X-ray Photons through a Thin Film under Total Internal Reflection Conditions.
- Authors
Touriyanskiĭ, A. G.; Pirshin, I. V.
- Abstract
Tunneling of 0.154- and 0.139-nm x-ray photons through a thin film under total internal reflection conditions has been experimentally demonstrated. The NiSi2 film 13 nm thick is deposited by magnetron sputtering on a polished Si substrate. A beam with an angular spread of 20′′ is directed to the Si/NiSi2 interface from the inside through the lateral surface of a sample. A peak associated with tunneling of photons from Si to air through the NiSi2 film is observed at grazing angles of θ1 > 0.4θc, where θc is the critical angle of total internal reflection at the Si/NiSi2 interface. The integral intensity of tunneling peaks that is measured for various θ1 angles agrees with the calculations. © 2005 Pleiades Publishing, Inc.
- Subjects
THIN films; QUANTUM tunneling; MAGNETRONS; PHOTONS; PHYSICS
- Publication
JETP Letters, 2005, Vol 81, Issue 10, p491
- ISSN
0021-3640
- Publication type
Article
- DOI
10.1134/1.1996755