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- Title
Optical Properties of Nonstoichiometric Tantalum Oxide TaO<sub>x</sub> (x < 5/2) According to Spectral-Ellipsometry and Raman-Scattering Data.
- Authors
Kruchinin, V. N.; Volodin, V. A.; Perevalov, T. V.; Gerasimova, A. K.; Aliev, V. Sh.; Gritsenko, V. A.
- Abstract
Optical properties of amorphous nonstoichiometric tantalum-oxide films of variable composition (TaOx, x = 1.94-2.51) in the spectral range of 1.12-4.96 eV, obtained by ion-beam sputtering-deposition of metallic tantalum at different partial oxygen pressures (0.53-9.09 × 10-3 Pa), have been investigated. It is shown by spectral ellipsometry that the character of dispersion of the absorption coefficient and refractive index in TaOx of variable composition suggests that light-absorbing films with dispersion similar to that in metals are formed at oxygen pressures in the growth chamber below 2.21 × 10-3 Pa, whereas transparent films with dielectric dispersion are formed at pressures above 2.81 × 10-3 Pa. According to the data of quantumchemical simulation, the absorption peak at a photon energy of 4.6 eV in TaOx observed in the absorptioncoefficient dispersion spectrum is due to oxygen vacancy. The peak in the Raman-scattering spectra of TaOx films with metallic dispersion at frequencies of 200-230 cm-1 is presumably related to tantalum nanoclusters.
- Subjects
NONSTOICHIOMETRIC compounds; OPTICAL properties; ELLIPSOMETRY; TANTALUM oxide; RAMAN scattering
- Publication
Optics & Spectroscopy, 2018, Vol 124, Issue 6, p808
- ISSN
0030-400X
- Publication type
Article
- DOI
10.1134/S0030400X18060140