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- Title
Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review.
- Authors
Nan Lin; Yunyi Chen; Xin Wei; Wenhe Yang; Yuxin Leng
- Abstract
With the development of high-volume manufacturing for very-large-scale integrated circuits, the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to fulfil extreme requirements in order to avoid thermal effect, optical distortion and critical dimension errors caused by out-of-band radiations. This paper reviews the key technologies and developments of the spectral purity systems for both a free-standing system and a built-in system integrated with the collector. The main challenges and developing trends are also discussed, with a view towards practical applications for further improvement. Designing and manufacturing spectral purity systems for EUVL is not a single task; rather, it requires systematic considerations for all relevant modules. Moreover, the requirement of spectral purity filters drives the innovation in filtering technologies, optical micromachining and advanced metrology.
- Subjects
EXTREME ultraviolet lithography; INTEGRATED circuits manufacturing; LASER plasmas; OPTICAL distortion; LIGHT sources
- Publication
High Power Laser Science & Engineering, 2023, Vol 11, p1
- ISSN
2095-4719
- Publication type
Article
- DOI
10.1017/hpl.2023.53