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- Title
Submicron metal patterns of arbitrary geometry fabricated by means of selective removal of oxygen atoms from molybdenum oxide.
- Authors
Domantovsky, A.; Maslakov, K.
- Abstract
The possibility of manufacturing metal patterns with submicron linear elements on a silicon substrate by means of the selective removal of oxygen atoms from metal oxide is demonstrated for the first time. Structures of 0.35-μm-wide molybdenum stripes with a thickness of 20 nm have been obtained using 3-keV proton irradiation of a molybdenum oxide film on a silicon substrate via an electron-beam resist mask, followed by removal of the resist and the non-reduced oxide regions. The proposed method can be used for the fabrication of submicron metal patterns of arbitrary geometry on various substrates.
- Subjects
MOLYBDENUM; METALLIC oxides; SILICON; IRRADIATION; OXYGEN
- Publication
Technical Physics Letters, 2008, Vol 34, Issue 4, p316
- ISSN
1063-7850
- Publication type
Article
- DOI
10.1134/S1063785008040147