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- Title
λ/30 inorganic features achieved by multi-photon 3D lithography.
- Authors
Jin, Feng; Liu, Jie; Zhao, Yuan-Yuan; Dong, Xian-Zi; Zheng, Mei-Ling; Duan, Xuan-Ming
- Abstract
It's critically important to construct arbitrary inorganic features with high resolution. As an inorganic photoresist, hydrogen silsesquioxane (HSQ) has been patterned by irradiation sources with short wavelength, such as EUV and electron beam. However, the fabrication of three- dimensional nanoscale HSQ features utilizing infrared light sources is still challenging. Here, we demonstrate femtosecond laser direct writing (FsLDW) of HSQ through multi-photon absorption process. 26 nm feature size is achieved by using 780 nm fs laser, indicating super-diffraction limit photolithography of λ/30 for HSQ. HSQ microstructures by FsLDW possess nanoscale resolution, smooth surface, and thermal stability up to 600 °C. Furthermore, we perform FsLDW of HSQ to construct structural colour and Fresnel lens with desirable optical properties, thermal and chemical resistance. This study demonstrates that inorganic features can be flexibly achieved by FsLDW of HSQ, which would be prospective for fabricating micro-nano devices requiring nanoscale resolution, thermal and chemical resistance. Stereolithography has progressed over the years but resolution and feature size is still limited by the properties of materials and resins. Here, the authors demonstrate femtosecond laser direct writing of a hydrogen silsesquioxane photoresist using a 780 nm femtosecond laser demonstrating feature sizes of 26 nm.
- Subjects
FEMTOSECOND lasers; MULTIPHOTON absorption; LIGHT sources; STRUCTURAL colors; MULTIPHOTON processes; ELECTRON beams; FEMTOSECOND pulses
- Publication
Nature Communications, 2022, Vol 13, Issue 1, p1
- ISSN
2041-1723
- Publication type
Article
- DOI
10.1038/s41467-022-29036-7