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- Title
Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs.
- Authors
Yeh, Yen-Wei; Lin, Su-Hui; Hsu, Tsung-Chi; Lai, Shouqiang; Lee, Po-Tsung; Lien, Shui-Yang; Wuu, Dong-Sing; Li, Guisen; Chen, Zhong; Wu, Tingzhu; Kuo, Hao-Chung
- Abstract
In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step coverage, the characteristics of atomic layer deposition ALD technology are used to solve this problem. ALD utilizes self-limiting interactions between the precursor gas and the substrate surface. When the reactive gas forms a single layer of chemical adsorbed on the substrate surface, no reaction occurs between them and the growth thickness can be controlled. At the Å level, it can provide good step coverage. In this study, recent research on the ALD passivation on micro-light-emitting diodes and vertical cavity surface emitting lasers was reviewed and compared. Several passivation methods were demonstrated to lead to enhanced light efficiency, reduced leakage, and improved reliability.
- Subjects
ATOMIC layer deposition; SURFACE emitting lasers; LED displays; SEMICONDUCTOR lasers; PLASMA-enhanced chemical vapor deposition; SEMICONDUCTOR devices; PROBLEM solving
- Publication
Nanoscale Research Letters, 2021, Vol 16, Issue 1, p1
- ISSN
1931-7573
- Publication type
Article
- DOI
10.1186/s11671-021-03623-x