Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleNovel photoresist design based on electrophilic aromatic substitution.AuthorsReck, B.; Allen, R. D.; Twieg, R. J.; Willson, C. G.; Matuszczak, S.; Stover, H. D. H.; Li, N. H.; Fréchet, J. M. J.PublicationPolymer Engineering & Science, 1989, Vol 29, Issue 14, p960ISSN0032-3888Publication typeArticleDOI10.1002/pen.760291415