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- Title
Effect of O ion implantation on the electrical and structural properties of Cu nanowires.
- Authors
Chauhan, R.; Rana, Pallavi
- Abstract
Ion beam creates changes in the material along their track, not only embody the excellent properties but also tailor new materials. When the ions are implanted into the nanomaterials, they collide with the target atoms and interact through three different phenomena; electron collision, nuclear collision and charge exchange. In the present study, 1 MeV O ions were implanted in copper nanowires of diameter 80 nm synthesized using template synthesis approach. Electrical and structural properties were recorded using Keithley 2400 series source meter and Rigaku X-ray diffractometer respectively, before and after the implantation. I- V characteristics showed the ohmic behavior with enhancement in conductivity of copper nanowires after implantation. No structural damage in the nanowires was revealed by XRD spectra. The work done can be viewed as a positive aspect of implantation in metallic nanowires especially in 80 nm diameter Cu nanowires and may be utilized to fabricate nanodevices.
- Subjects
ION implantation; CRYSTAL structure; ELECTRIC properties of nanowires; COPPER; ION beams; X-ray diffractometers; NANOSTRUCTURED materials
- Publication
Journal of Radioanalytical & Nuclear Chemistry, 2014, Vol 302, Issue 2, p851
- ISSN
0236-5731
- Publication type
Article
- DOI
10.1007/s10967-014-3262-3