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- Title
High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers.
- Authors
Wang, Hyun Suk; Oh, Seula; Choi, Junhwan; Jang, Wontae; Kim, Ki Hyun; Arellano, Carlos Luis; Huh, June; Bang, Joona; Im, Sung Gap
- Abstract
High-Fidelity, Sub-5 nm Patterns from High- Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers B Front Cover b : In article 1900514 by Joona Bang, Sung Gap Im, and co-workers, a robust neutralization methodology is developed to neutralize the two interfaces in a block copolymer film via initiated chemical vapor deposition. A highly uniform film of crosslinked AB-type random copolymers, sandwich an AB-type block copolymer film to produce perpendicular sub-5 nm nanodomains.
- Subjects
THIN films; RANDOM copolymers; CHEMICAL vapor deposition; BLOCK copolymers
- Publication
Macromolecular Rapid Communications, 2020, Vol 41, Issue 4, p1
- ISSN
1022-1336
- Publication type
Article
- DOI
10.1002/marc.201900514