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- Title
PHOTOACOUSTIC STUDIES ON TiAlN NANOSTRUCTURED THIN FILMS.
- Authors
SRINIVASAN, R.; IRUDAYARAJ, A. ALBERT; KUPPUSAMI, P.; MOHANDAS, E.; KALAINATHAN, S.; RAMACHANDRAN, K.
- Abstract
Nanostructured titanium aluminium nitride (TiAlN) thin films were prepared on Si (111) substrate by reactive DC magnetron sputtering technique for various N2 flow rates. X-ray diffraction showed that the films are nanocrystalline and the grain size decreases from 14 nm to 5 nm as the N2 flow rate is increased. The thermal properties are then studied by photoacoustic (PA) spectroscopy. The study revealed an increase in thermal diffusivity and conductivity with increasing N2 flow rates, and the measured values of the thermal properties are significantly lower than those obtained with bulk materials which constitute TiAlN.
- Subjects
TITANIUM; ALUMINUM nitride; X-rays; OPTICAL diffraction; THIN films; THERMAL properties; PHOTOACOUSTIC spectroscopy
- Publication
International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2007, Vol 21, Issue 22, p3889
- ISSN
0217-9792
- Publication type
Article
- DOI
10.1142/S0217979207037806