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- Title
Structural, Surface, and Electronic Structure Properties of Ag<sup>−</sup> Ion-Implanted SrVO<sub>3</sub> Thin Films.
- Authors
Sharma, Aditya; Devi, Ksh. Devarani; Varshney, Mayora; Saraswat, Himani; Chaudhary, Surekha; Lee, Byeong-hyeon; Kim, So-Hee; Won, Sung Ok; Chae, Keun Hwa; Vij, Ankush; Sharma, Ram K.; Shin, Hyun-Joon
- Abstract
SrVO3 films have been deposited on quartz substrates using radiofrequency (RF) sputtering technique. Ag− ions have been implanted with three fluences: 1 × 1015 ions/cm2, 3 × 1015 ions/cm2, and 5 × 1015 ions/cm2. The glancing-angle x-ray diffraction (GIXRD) results exhibited a decrease in the peak intensity; however, the results ruled out the possibility of other secondary phase formation upon increasing the Ag− ion fluence. Field emission scanning electron microscopy (FESEM) results revealed that Ag implantation has sputtered the surface layer and created rough/emptied films. Significant broadening/splitting of V L2 near-edge x-ray absorption fine structure (NEXAFS) spectra convey the incorporation of Ag 4d states in the energy band structure of SrVO3 and electronic transitions from V 2p1/2 states to the Ag-related states. O K-edge spectra have ruled out the charge transfer of O 1s orbits to the Ag states, even upon increasing the Ag concentration, and nullified the formation of AgO types of secondary phases.
- Subjects
THIN films; ELECTRONIC structure; ELECTRONIC band structure; FIELD emission electron microscopy; ENERGY bands; X-ray absorption
- Publication
Journal of Electronic Materials, 2022, Vol 51, Issue 5, p1900
- ISSN
0361-5235
- Publication type
Article
- DOI
10.1007/s11664-022-09454-5