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- Title
Revised mathematical model for assessment of thermal characteristics developed in ultrafast pulse laser assisted nanoimprinting lithography on silicon based substrate surface.
- Authors
Dutta, Jaideep
- Abstract
The development of nanotechnology and nanoscience is largely dependent upon nanopatterning and nanofabrication and it is commonly achieved by photolithography which has been evolved is last decade so that 90 nm and even 65 nm line-width can be achieved in the semiconductor industry i.e. digital manufacturing sector in recent times. Laser-assisted nanoimprint lithography is a process in which polymer is melted by a single excimer laser pulse followed by imprinted by a mould made of fused quartz. Present research work is focused on silicon materials and utilized a single KrF excimer laser pulse (248 nm wavelength and 30 ns pulse duration) as the heating source. Mathematical modelling is carried out on the basis of hybrid application of Duhamel's application and finite integral transform approach. The thermal field is investigated in both mould and substrate surface for different nanoscale process parameters. For the first time, most updated heat transfer model is employed in this arena as dual-phase-lag heat conduction model is universally accepted for application in microscale and nanoscale structures. The research outcome is successfully validated with the published research papers and the importance of multi-dimensional modelling in the arena of nanofabrication has been demonstrated.
- Subjects
LASER pulses; NANOSILICON; MATHEMATICAL models; NANOIMPRINT lithography; LITHOGRAPHY; FUSED silica; DISTRIBUTED feedback lasers; EXCIMER lasers
- Publication
Optical & Quantum Electronics, 2024, Vol 56, Issue 1, p1
- ISSN
0306-8919
- Publication type
Article
- DOI
10.1007/s11082-023-05594-y