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- Title
Low-Pressure Plasma Reactor with a Cylindrical Electrode for Eco-friendly Processing in the Semiconductor Industry.
- Authors
Hur, M.; Lee, J.; Kang, W.; Song, Y.-H.
- Abstract
Thin film deposition processes emit large amounts of NF and by-product particles, which are of great concerns in the semiconductor industry, from the environmental and economic points of view. With an objective to overcome these concerns, plasmas are generated from a cylindrical reactor placed before a vacuum pump. The discharge stability is evaluated by monitoring the changes in the plasma images with the pressure. By using a particle sampler and a particle trap, the size and quantity of the by-product particles are compared during plasma-on and plasma-off. The effects of adding O and HO to the by-products of the NF abatement process are investigated by analyzing the spectra obtained with a Fourier transform infrared spectroscopy. Further, the HO flow rate is optimized for the highest destruction and removal efficiency of NF. Finally, the applicability of our device to the after-treatment equipment is discussed.
- Subjects
SEMICONDUCTOR industry; LOW pressure (Science); PLASMA chemistry; ELECTROCHEMICAL electrodes; PLASMA flow
- Publication
Plasma Chemistry & Plasma Processing, 2014, Vol 34, Issue 5, p1187
- ISSN
0272-4324
- Publication type
Article
- DOI
10.1007/s11090-014-9554-0