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- Title
Fabrication of Semiconductor- and Polymer-Based Photonic Crystals Using Nanoimprint Lithography.
- Authors
Arakcheeva, E. M.; Tanklevskaya, E. M.; Nesterov, S. I.; Maksimov, M. V.; Gurevich, S. A.; Seekamp, J.; Torres, C. M. Sotomayor
- Abstract
The technology of fabricating photonic crystals with the use of nanoimprint lithography is described. One- and two-dimensional photonic crystals are produced by direct extrusion of polymethyl methacrylate by Si moulds obtained via interference lithography and reactive ion etching. The period of 2D photonic crystals, which present a square array of holes, ranges from 270 to 700 nm; the aperture diameter amounts to the half-period of the structure. The holes are round-shaped with even edges. One-dimensional GaAs-based photonic crystals are fabricated by reactive ion etching of GaAs to a depth of 1 μm through a mask formed using nanoimprint lithography. The resulting crystals have a period of 800 nm, a ridge width of 200 nm, and smooth nearly vertical side walls. © 2005 Pleiades Publishing, Inc.
- Subjects
SEMICONDUCTORS; CRYSTALS; LITHOGRAPHY; POLYMERS; POLYMETHYLMETHACRYLATE; CRYSTAL etching; PHYSICS
- Publication
Technical Physics, 2005, Vol 50, Issue 8, p1043
- ISSN
1063-7842
- Publication type
Article
- DOI
10.1134/1.2014536