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- Title
High-order diffraction for optical superfocusing.
- Authors
He, Jun; Liu, Hong; Zhao, Dong; Mehta, Jodhbir S.; Qiu, Cheng-Wei; Sun, Fangwen; Teng, Jinghua; Huang, Kun
- Abstract
High-order diffraction (HOD) from optical microstructures is undesirable in many applications because of the accompanying ghosting patterns and loss of efficiency. In contrast to suppressing HOD with subwavelength structures that challenge the fabrication of large-scale devices, managing HOD is less developed due to the lack of an efficient method for independently manipulating HOD. Here, we report independent manipulation of HODs, which are unexploited for subdiffraction-limit focusing in diffractive lenses, through an analytical formula that correlates the diffraction order and the width of each zone. The large spatial frequencies offered by the HODs enable our lenses to reduce the lateral focal size down to 0.44 λ even without any subwavelength feature (indispensable in most high-NA diffractive lenses), facilitating large-scale manufacture. Experimentally, we demonstrate high-order lens-based confocal imaging with a center-to-center dry resolution of 190 nm, the highest among visible-light confocal microscopies, and laser-ablation lithography with achieved direct-writing resolution of 400 nm (0.385 λ). The authors introduce the independent manipulation of high-order diffraction with a high-order diffractive lens for sub-diffraction limit focusing in confocal microscopy and laser ablation lithography.
- Subjects
CONFOCAL microscopy; OPTICAL diffraction; LASER ablation; LASER microscopy; LITHOGRAPHY
- Publication
Nature Communications, 2024, Vol 15, Issue 1, p1
- ISSN
2041-1723
- Publication type
Article
- DOI
10.1038/s41467-024-52256-y