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- Title
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique.
- Authors
Shapovalov, A. P.; Korotash, I. V.; Rudenko, E. M.; Sizov, F. F.; Dubyna, D. S.; Osipov, L. S.; Polotskiy, D. Yu.; Tsybrii, Z. F.; Korchovyi, A. A.
- Abstract
Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN films (reflection and transmission spectra within the range 2...25 μm) has been carried out by using the infrared Fourier spectrometer Spectrum BX-II. It has been shown that the obtained composite structures (AlN coatings on teflon and mylar substrates) could be used as passive filters in the infrared spectral range.
- Subjects
ALUMINUM nitride films; OPTICAL properties; COATING processes; CRYSTAL structure; PLASMA deposition; POLYETHYLENE terephthalate
- Publication
Semiconductor Physics, Quantum Electronics & Optoelectronics, 2015, Vol 18, Issue 2, p117
- ISSN
1560-8034
- Publication type
Article
- DOI
10.15407/spqeo18.02.117