Back to matchesWe found a matchYour institution may have access to this item. Find your institution then sign in to continue.TitleSensitive Photoresists for Rapid Multiphoton 3D Laser Micro‐ and Nanoprinting.AuthorsKiefer, Pascal; Hahn, Vincent; Nardi, Martina; Yang, Liang; Blasco, Eva; Barner‐Kowollik, Christopher; Wegener, MartinPublicationAdvanced Optical Materials, 2020, Vol 8, Issue 19, p1ISSN2195-1071Publication typeArticleDOI10.1002/adom.202000895